Nanometer-scale resolution of strain and interdiffusion in self-assembled InAs/GaAs quantum dots

被引:213
作者
Kegel, I [1 ]
Metzger, TH
Lorke, A
Peisl, J
Stangl, J
Bauer, G
García, JM
Petroff, PM
机构
[1] Univ Munich, CeNS, Sekt Phys, D-80359 Munich, Germany
[2] Johannes Kepler Univ Linz, Inst Halbleiterphys, A-4040 Linz, Austria
[3] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
关键词
D O I
10.1103/PhysRevLett.85.1694
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Tomographic nanometer-scale images of self-assembled InAs/GaAs quantum dots have been obtained from surface-sensitive x-ray diffraction. Based on the three-dimensional intensity mapping of selected regions in reciprocal space, the method yields the shape of the dots along with the lattice parameter distribution and the vertical interdiffusion profile on a subnanometer scale. The material composition is found to vary continuously from GaAs at the base of the dot to InAs at the top.
引用
收藏
页码:1694 / 1697
页数:4
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