Fabrication of 2-D and 3-D silicon photonic crystals by deep etching

被引：39

作者：

Chelnokov, A

David, S

Wang, K

Marty, F

Lourtioz, JM

机构：

[1] CNRS, UMR 8622, Inst Elect Fondamentale, F-91405 Orsay, France

[2] Univ Paris 11, CNRS, Phys Solides Lab, F-91405 Orsay, France

[3] ESIEE, F-93162 Noisy Le Grand, France

来源：

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2002年 / 8卷 / 04期

关键词：

optical device fabrication; optical diffraction; optical planar waveguide components; photonic crystals;

D O I：

10.1109/JSTQE.2002.801736

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Deep etching methods applied to semiconductors allow the fabrication of two-dimensional and three-dimensional photonic crystals. The use of chemical, plasma, and focused ion beam etch applied to silicon is reviewed.

引用

页码：919 / 927

页数：9

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