Optical bandgap energy of wurtzite InN

被引:712
作者
Matsuoka, T
Okamoto, H
Nakao, M
Harima, H
Kurimoto, E
机构
[1] NTT Corp, Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
[2] NTT Corp, Photon Labs, Atsugi, Kanagawa 2430198, Japan
[3] Kyoto Inst Technol, Dept Elect & Informat Sci, Sakyo Ku, Kyoto 6068585, Japan
[4] Osaka Univ, Dept Appl Phys, Suita, Osaka 5650871, Japan
关键词
D O I
10.1063/1.1499753
中图分类号
O59 [应用物理学];
学科分类号
摘要
Wurtzite InN films were grown on a thick GaN layer by metalorganic vapor phase epitaxy. Growth of a (0001)-oriented single crystalline layer was confirmed by Raman scattering, x-ray diffraction, and reflection high energy electron diffraction. We observed at room temperature strong photoluminescence (PL) at 0.76 eV as well as a clear absorption edge at 0.7-1.0 eV. In contrast, no PL was observed, even by high power excitation, at similar to1.9 eV, which had been reported as the band gap in absorption experiments on polycrystalline films. Careful inspection strongly suggests that a wurtzite InN single crystal has a true bandgap of 0.7-1.0 eV, and the discrepancy could be attributed to the difference in crystallinity. (C) 2002 American Institute of Physics.
引用
收藏
页码:1246 / 1248
页数:3
相关论文
共 11 条
[1]   Experimental and theoretical studies of phonons in hexagonal InN [J].
Davydov, VY ;
Emtsev, VV ;
Goncharuk, IN ;
Smirnov, AN ;
Petrikov, VD ;
Mamutin, VV ;
Vekshin, VA ;
Ivanov, SV ;
Smirnov, MB ;
Inushima, T .
APPLIED PHYSICS LETTERS, 1999, 75 (21) :3297-3299
[2]  
Davydov VY, 2002, PHYS STATUS SOLIDI B, V229, pR1, DOI 10.1002/1521-3951(200202)229:3<R1::AID-PSSB99991>3.0.CO
[3]  
2-O
[4]   Phonon dispersion and Raman scattering in hexagonal GaN and AlN [J].
Davydov, VY ;
Kitaev, YE ;
Goncharuk, IN ;
Smirnov, AN ;
Graul, J ;
Semchinova, O ;
Uffmann, D ;
Smirnov, MB ;
Mirgorodsky, AP ;
Evarestov, RA .
PHYSICAL REVIEW B, 1998, 58 (19) :12899-12907
[5]  
MATSUOKA T, 1990, P 16 INT S GAAS REL, P141
[6]   PREPARATION AND OPTICAL-PROPERTIES OF GA1-XINXN THIN-FILMS [J].
OSAMURA, K ;
NAKA, S ;
MURAKAMI, Y .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) :3432-3437
[7]   SYNTHESIS OF 3-5 SEMICONDUCTOR NITRIDES BY REACTIVE CATHODIC SPUTTERING [J].
PUYCHEVRIER, N ;
MENORET, M .
THIN SOLID FILMS, 1976, 36 (01) :141-145
[8]   GAN, AIN, AND INN - A REVIEW [J].
STRITE, S ;
MORKOC, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (04) :1237-1266
[9]   OPTICAL BAND-GAP OF INDIUM NITRIDE [J].
TANSLEY, TL ;
FOLEY, CP .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (09) :3241-3244
[10]   THE EFFECTS OF OXYGEN CONTAMINATION ON THE PROPERTIES OF REACTIVELY SPUTTERED INDIUM NITRIDE FILMS [J].
WESTRA, KL ;
LAWSON, RPW ;
BRETT, MJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :1730-1732