Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy

被引:39
作者
Wang, SY
Chu, PK
Tang, BY
Zeng, XC
Chen, YB
Wang, XF
机构
[1] CITY UNIV HONG KONG,DEPT PHYS & MAT SCI,KOWLOON,HONG KONG
[2] HARBIN INST TECHNOL,HARBIN 150006,PEOPLES R CHINA
关键词
plasma immersion ion implantation; plasma nitriding;
D O I
10.1016/S0257-8972(97)00066-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TIN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples, RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly developed inductively coupled RF plasma source which is responsible for the success of the experiments is also described. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:309 / 313
页数:5
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