Photocatalytic TiO2 deposition by chemical vapor deposition

被引:161
作者
Byun, D
Jin, Y
Kim, B
Lee, JK
Park, D
机构
[1] Korea Univ, Dept Mat Sci, Sungbuk Ku, Seoul 136701, South Korea
[2] LG Electron, PCB BGA, Osan 447100, Kyungki Do, South Korea
[3] Korea Inst Sci & Technol, Clean Technol Res Ctr, Seoul 130650, South Korea
关键词
TiO2; photocatalytic; CVD; preferred orientation;
D O I
10.1016/S0304-3894(99)00179-X
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO2 films on window glass substrates. Post-annealing at high temperature required for other deposition methods causes sodium ion diffusion into TiO2 film from window glass, resulting in the degradation of photocatalytic efficiency. Anatase-structured TiO2 thin films were deposited on window glass by CVD, and the photocatalytic dissociation rates of benzene with CVD-grown TiO2 under UV exposure were characterized. As the TiO2 film deposition temperature was increased, the (112)-preferred orientations were observed in the film. The (112)-preferred orientation of TiO2 thin film resulted in a columnar structure with a larger surface area for benzene dissociation. Obviously, benzene dissociation rate was maximum when the degree of the (112) preferential orientation was maximum. It is clear that the thin film TiO2 should be controlled to exhibit the preferred orientation for the optimum photocatalytic reaction rate. CVD method is an alternative for the deposition of photocatalytic TiO2. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:199 / 206
页数:8
相关论文
共 19 条
[1]   EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF TITANIUM-OXIDES [J].
DEMIRYONT, H ;
SITES, JR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (04) :1457-1460
[2]   CHARACTERISTICS OF TITANIUM-OXIDE FILMS DEPOSITED BY AN ACTIVATED REACTIVE EVAPORATION METHOD [J].
FUJII, T ;
SAKATA, N ;
TAKADA, J ;
MIURA, Y ;
DAITOH, Y ;
TAKANO, M .
JOURNAL OF MATERIALS RESEARCH, 1994, 9 (06) :1468-1473
[3]   Photocatalytic disinfection of indoor air [J].
Goswami, DY ;
Trivedi, DM ;
Block, SS .
JOURNAL OF SOLAR ENERGY ENGINEERING-TRANSACTIONS OF THE ASME, 1997, 119 (01) :92-96
[4]   REMOVAL OF LOW CONCENTRATION NITROGEN-OXIDES THROUGH PHOTOASSISTED HETEROGENEOUS CATALYSIS [J].
IBUSUKI, T ;
TAKEUCHI, K .
JOURNAL OF MOLECULAR CATALYSIS, 1994, 88 (01) :93-102
[5]  
KIM DH, 1993, P 1 INT C TIO2 PHOT, P26
[6]   CHARACTERIZATION OF TIO(2) PHOTOCATALYSTS USED IN TRICHLOROETHENE OXIDATION [J].
LARSON, SA ;
FALCONER, JL .
APPLIED CATALYSIS B-ENVIRONMENTAL, 1994, 4 (04) :325-342
[7]   PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF TIO2 IN MICROWAVE-RADIO FREQUENCY HYBRID PLASMA REACTOR [J].
LEE, YH ;
CHAN, KK ;
BRADY, MJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :596-601
[8]  
LIN WY, 1997, J ELECTROCHEM SOC, V114, P497
[9]  
MAARTIN PJ, 1986, J MATER SCI, V21, P1
[10]  
MARUSKA HP, 1978, SOL ENERGY, V20, P453