Analysis of the degradation of PZT and SrBi2Ta2O9 thin films with a reductive process

被引:60
作者
Hase, T
Noguchi, T
Miyasaka, Y
机构
[1] Fundamental Research Laboratories, NEC Corporation, Miyamae-ku, Kawasaki 216
关键词
D O I
10.1080/10584589708013027
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electrical properties, crystal structure and composition were analyzed about ferroelectric PZT and SET thin films with a reductive heat treatment. PZT films annealed in the atmosphere containing H-2 turned into paraelectric, while SET films were shorted. Ferroelectricity of these degraded films recovered by a subsequent anneal in oxygen. Oxygen content in PZT and SET films decreased by the reductive heat treatment and was compensated by the subsequent anneal in oxygen. Residual hydrogen was also detected in reduced SBT films. The loss of ferroelectricity or short of capacitor would be due to the oxygen defects and the residual hydrogen in ferroelectric thin films. A TiN layer covering ferroelectric capacitors acted as an Hz barrier. Pt top electrode also played a role in preventing the reduction. This effect was enhanced by using a Pt electrode thicker than 300 nm and by anneal it at 600 degrees C.
引用
收藏
页码:29 / 40
页数:12
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