共 10 条
[1]
AMANO T, IN PRESS I ELECT ENG
[2]
FURUKAWA N, 1999, P 7 MICR C, P70
[5]
Koyama F., 1997, P OSA TECH DIG SERIE, V9, P90
[7]
Vertical and smooth etching of InP by Cl2/Xe inductively coupled plasma
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1999, 38 (7A)
:4260-4261