Resistive switching mechanism in ZnxCd1-xS nonvolatile memory devices

被引:85
作者
Wang, Zheng [1 ]
Griffin, Peter B.
McVittie, Jim
Wong, Simon
McIntyre, Paul C.
Nishi, Yoshio
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
关键词
chalcogenide; nonvolatile memory; resistive switching; ZnCdS;
D O I
10.1109/LED.2006.887640
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nonvolatile information storage devices based on an abrupt resistance switch when an electric bias is applied are very attractive for future memory applications. Recently, such a resistance switch was described in ferroelectric ZnxCd1-xS, but the mechanism of switching remains controversial. Here, we present results that elucidate the mechanism, showing that a metal needs to be easily oxidized and is capable of diffusing into the ZnCdS film as a cation impurity forming a filamentary metallic conduction path.
引用
收藏
页码:14 / 16
页数:3
相关论文
共 19 条
[1]  
[Anonymous], 2005, INT TECHNOLOGY ROADM
[2]   Reproducible switching effect in thin oxide films for memory applications [J].
Beck, A ;
Bednorz, JG ;
Gerber, C ;
Rossel, C ;
Widmer, D .
APPLIED PHYSICS LETTERS, 2000, 77 (01) :139-141
[3]   ZNXCD1-XS FILMS FOR USE IN HETEROJUNCTION SOLAR-CELLS [J].
BURTON, LC ;
HENCH, TL .
APPLIED PHYSICS LETTERS, 1976, 29 (09) :612-614
[4]   Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition -: art. no. 033715 [J].
Choi, BJ ;
Jeong, DS ;
Kim, SK ;
Rohde, C ;
Choi, S ;
Oh, JH ;
Kim, HJ ;
Hwang, CS ;
Szot, K ;
Waser, R ;
Reichenberg, B ;
Tiedke, S .
JOURNAL OF APPLIED PHYSICS, 2005, 98 (03)
[5]   SWITCHING PROPERTIES OF THIN NIO FILMS [J].
GIBBONS, JF ;
BEADLE, WE .
SOLID-STATE ELECTRONICS, 1964, 7 (11) :785-&
[6]   Determination of the optimal cation composition of ferroelectric (ZnxCd1-x)S thin films for applications to silicon-based nonvolatile memories [J].
Hotta, Y ;
Rokuta, E ;
Jhoi, JH ;
Tabata, H ;
Kobayashi, H ;
Kawai, T .
APPLIED PHYSICS LETTERS, 2002, 80 (17) :3180-3182
[7]   Non-volatile memory based on solid electrolytes [J].
Kozicki, MN ;
Gopalan, C ;
Balakrishnan, M ;
Park, M ;
Mitkova, M .
2004 NON-VOLATILE MEMORY TECHNOLOGY SYMPOSIUM, PROCEEDINGS, 2004, :10-17
[8]   Resistance switching of the nonstoichiometric zirconium oxide for nonvolatile memory applications [J].
Lee, D ;
Choi, H ;
Sim, H ;
Choi, D ;
Hwang, H ;
Lee, MJ ;
Seo, SA ;
Yoo, IK .
IEEE ELECTRON DEVICE LETTERS, 2005, 26 (10) :719-721
[9]   Bistable resistive switching of a sputter-deposited Cr-doped SrZrO3 memory film [J].
Liu, CY ;
Wu, PH ;
Wang, A ;
Jang, WY ;
Young, JC ;
Chiu, KY ;
Tseng, TY .
IEEE ELECTRON DEVICE LETTERS, 2005, 26 (06) :351-353
[10]   Electrical current distribution across a metal-insulator-metal structure during bistable switching [J].
Rossel, C ;
Meijer, GI ;
Brémaud, D ;
Widmer, D .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (06) :2892-2898