Study of nanoscale recorded marks on phase-change recording layers and the interactions with surroundings

被引：12

作者：

Lin, Shih Kai ^{[1
]}

Lin, I. Chun

Chen, Sen Yong

Hsu, Hao Wen

Tsai, Din Ping

机构：

[1] Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan

[2] Natl Taiwan Univ, Ctr Nanostorage Res, Taipei 10617, Taiwan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2007年 / 43卷 / 02期

关键词：

conductive-atomic force microscopy (C-AFM); DVD; optical disk; phase-change recording layer; recorded mark; writing strategy;

D O I：

10.1109/TMAG.2006.888471

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Conductive-atomic force microscopy (C-AFM) has been used for studying nanoscale recorded marks with different length on the phase-change recording layer of optical disks. Through C-AFM images, a comparison of nanoscale recorded marks on phase-change recording layer under different writing strategies and writing power has been taken. The comparison can help analyze the combination of writing strategy, writing power and laser pulse width. The various lengths,of recorded marks for high density data storage have also been found out. The interactions between phase-change recording layers and their surroundings have also been studied. This study opens up a possibility to improve the capacity of data storage in today's commercial optical disks.

引用

页码：861 / 863

页数：3

共 5 条

[1] Characterization of nano recorded marks at different writing strategies on phase-change recording layer of optical disks [J].

Lin, Shih Kai ;

Lin, I. Chun ;

Tsai, Din Ping .

OPTICS EXPRESS, 2006, 14 (10) :4452-4458

[2] Resolving nano scale recording bits on phase-change rewritable optical disk [J].

Lin, SK ;

Yang, PL ;

Lin, IC ;

Hsu, HW ;

Tsai, DP .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (2B) :1431-1434

[3] Static tester for characterization of phase-change, dye-polymer, and magneto-optical media for optical data storage [J].

Mansuripur, M ;

Erwin, JK ;

Bletscher, W ;

Khulbe, P ;

Sadeghi, K ;

Xun, XD ;

Gupta, A ;

Mendes, SB .

APPLIED OPTICS, 1999, 38 (34) :7095-7104

[4] Analysis of mark-formation process for phase-change media [J].

Miyamoto, M ;

Hirotsune, A ;

Miyauchi, Y ;

Ando, K ;

Terao, M ;

Tokusyuku, N ;

Tamura, R .

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1998, 4 (05) :826-831

[5]

Yang PL, 2005, J KOREAN PHYS SOC, V47, pS115

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