Design and fabrication of VCSEL's with AlxOy-GaAs DBR's

被引:52
作者
MacDougal, MH [1 ]
Dapkus, PD [1 ]
Bond, AE [1 ]
Lin, CK [1 ]
Geske, J [1 ]
机构
[1] UNIV SO CALIF,DEPT ELECT ENGN ELECTROPHYS,LOS ANGELES,CA 90089
关键词
distributed Bragg reflector lasers; optical device fabrication; semiconductor growth; semiconductor heterojunctions; semiconductor lasers;
D O I
10.1109/2944.640644
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A procedure for fabricating vertical-cavity surface-emitting lasers (VCSEL's) with oxide-based distributed Bragg reflectors (DBR's) is presented. An in-depth analysis of parameters and behavior unique to oxide VCSEL's determines the device design. The development cycle time for these devices is reduced through development of a method for post-growth analysis of the epitaxial stack reflectivity before device processing. Threshold currents as low as 160 mu A and resistances as low as 80 Omega are demonstrated using different device designs. The total optical loss of low-doped oxide VCSEL structures is 0.163% which is comparable to VCSEL designs based on all-semiconductor DBR's. The thermal resistance of an 8 x 8 mu m VCSEL is measured to be 2.8 degrees C/mW, demonstrating that the presence of oxide layers does not act as a barrier to heat flow out of the active region.
引用
收藏
页码:905 / 915
页数:11
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