Nanolithography of organic polysilane films using carbon nanotube tips - Application to the etching process

被引：5

作者：

Okazaki, A ^{[1
]}

Akita, S ^{[1
]}

Nakayama, Y ^{[1
]}

机构：

[1] Univ Osaka Prefecture, Dept Phys & Elect, Sakai, Osaka 5998531, Japan

来源：

PHYSICA B-CONDENSED MATTER | 2002年 / 323卷 / 1-4期

关键词：

carbon nanotubes; SPM tip; polysilane; patterning of Si;

D O I：

10.1016/S0921-4526(02)00884-0

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Direct nanolithography using a contact-mode scanning probe microscope for polysilane films has been studied as a function of humidity to investigate its mechanism. The result indicates the electrochemical reaction with moisture dominates the abscission of fragments of polysilanes. Carbon nanotube tips enable us to form grooves with the line width of 50nm in the polysilane films at 20% humidity. These fine patterns are transferred onto a Si substrate by chemical etching without the considerable degradation of the groove width. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：151 / 152

页数：2

共 3 条

[1] Direct nanolithography of organic polysilane films using carbon nanotube tips [J].

Okazaki, A ;

Kishida, T ;

Akita, S ;

Nishijima, H ;

Nakayama, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12B) :7067-7069

[2] Nanolithography of organic polysilane films using carbon nanotube tips [J].

Okazaki, A ;

Akita, S ;

Nishijima, H ;

Nakayama, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (6B) :3744-3746

[3] Combination of photo and atomic force microscope lithographies by use of an organosilane monolayer resist [J].

Sugimura, H ;

Nakagiri, N .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (7B) :L968-L970

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