Superhard nanocomposite Ti1-xAlxN films prepared by magnetron sputtering

被引:250
作者
Musil, J [1 ]
Hruby, H [1 ]
机构
[1] Univ W Bohemia, Dept Phys, Plzen 30614, Czech Republic
关键词
coatings; hardness; structural properties; sputtering;
D O I
10.1016/S0040-6090(00)00653-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ti1-xAlxN films were sputtered from an alloyed TiAl (60/40 at.%) target in Ar and Ar + N-2 mixture at a constant total pressure of 0.5 Pa by a planar round unbalanced magnetron of 100 mm in diameter. Films were sputtered at different partial pressures of nitrogen p(N2) ranging from 0 to 0.2 Pa, different substrate temperatures T-s ranging from room temperature RT to 400 degrees C and two substrate biases U-% = U-fl, i.e. floating potential, and U-s = -200 V. It was found that: (i) the continuous change in p(N2) induces a dramatic change in the film structure and (ii) different values of microhardness of Ti1-xAlxN films produced at different p(N2), correlate: well with changes in the film structure. Superhard (greater than or equal to 40 GPa) films with hardness of up to 47 GPa were prepared. The superhard films are nc-TiAlN/AlN nanocomposite films composed of relatively large (similar to 30 nm) TiAlN grains, oriented in one direction and surrounded by an amorphous and/or nc-AlN phase. These films exhibit a high elastic recovery up to 74% and contain about 20 at.% Ti, 25 at.% Al and 55 at.% N. The conditions under which superhard Ti1-xAlxN films can be prepared are given. (C) 2000 Elsevier science S.A. All rights reserved.
引用
收藏
页码:104 / 109
页数:6
相关论文
共 18 条
[1]   EFFECTS OF HIGH-FLUX LOW-ENERGY (20-100 EV) ION IRRADIATION DURING DEPOSITION ON THE MICROSTRUCTURE AND PREFERRED ORIENTATION OF TI0.5AL0.5N ALLOYS GROWN BY ULTRA-HIGH-VACUUM REACTIVE MAGNETRON SPUTTERING [J].
ADIBI, F ;
PETROV, I ;
GREENE, JE ;
HULTMAN, L ;
SUNDGREN, JE .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) :8580-8589
[2]   MATERIAL SELECTION FOR HARD COATINGS [J].
HOLLECK, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2661-2669
[3]  
*ICDD, 1997, PDF2 ICDD
[4]   INDUSTRIAL DEPOSITION OF BINARY, TERNARY, AND QUATERNARY NITRIDES OF TITANIUM, ZIRCONIUM, AND ALUMINUM [J].
KNOTEK, O ;
MUNZ, WD ;
LEYENDECKER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2173-2179
[5]   ON STRUCTURE AND PROPERTIES OF SPUTTERED TI AND AL BASED HARD COMPOUND FILMS [J].
KNOTEK, O ;
BOHMER, M ;
LEYENDECKER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2695-2700
[6]   THE DEVELOPMENT OF THE PVD COATING TIALN AS A COMMERCIAL COATING FOR CUTTING TOOLS [J].
LEYENDECKER, T ;
LEMMER, O ;
ESSER, S ;
EBBERINK, J .
SURFACE & COATINGS TECHNOLOGY, 1991, 48 (02) :175-178
[7]  
MIN Y, 1999, THIN SOLID FILMS, V339, P204
[8]  
MUNZ WD, 1986, J VAC SCI TECHNOL A, V4, P2717, DOI 10.1116/1.573713
[9]   ZrN/Cu nanocomposite film - a novel superhard material [J].
Musil, J ;
Zeman, P ;
Hruby, H ;
Mayrhofer, PH .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :179-183
[10]   Formation of Ti1-xSix and Ti1-xSixN films by magnetron co-sputtering [J].
Musil, J ;
Jankovcová, H ;
Cibulka, V .
CZECHOSLOVAK JOURNAL OF PHYSICS, 1999, 49 (03) :359-372