Germanium junction field effect transistor for cryogenic applications

被引:9
作者
Das, NC
Monroy, C
Jhabvala, M
机构
[1] NASA, Goddard Space Flight Ctr, Solid State Device Branch, Greenbelt, MD 20771 USA
[2] Raytheon ITSS, Lanham, MD 20706 USA
关键词
D O I
10.1016/S0038-1101(00)00013-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The n-channel germanium junction field effect transistor (Ge-JFET) was designed and fabricated for cryogenic applications. Ideal device current and voltage characteristics were obtained at cryogenic temperatures down to the liquid helium temperature (4.2 K). The Ge-JFET exhibits a superior noise performance at the liquid nitrogen temperature (77 K). From the device current voltage characteristics of n-channel JFETs, it is seen that the transconductance increases monotonically with the lowering of temperature to 4.2 K. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:937 / 940
页数:4
相关论文
共 10 条
[1]  
ARENTZ RF, 1982, P SOC PHOTO-OPT INS, V364, P141
[2]  
Bratt P. R., 1977, SEMICONDUCT SEMIMET, V12, P39
[3]   Silicon JFETs for cryogenic applications [J].
Das, NC ;
Babu, S ;
Jhabvala, MD .
PHOTODETECTORS: MATERIALS AND DEVICES III, 1998, 3287 :146-149
[4]  
DON KZ, 1978, SOV TECH PHYS LETT, V4, P446
[5]  
ELAD E, 1967, 14 NUCL S IEEE LOS A, P283
[6]   DESIGN CONSIDERATIONS FOR IMPROVING LOW-TEMPERATURE NOISE PERFORMANCE OF SILICON JFETS [J].
HASLETT, JW ;
KENDALL, EJM ;
SCHOLZ, FJ .
SOLID-STATE ELECTRONICS, 1975, 18 (02) :199-207
[7]   OPERATION OF A GERMANIUM FET AT LOW TEMPERATURES [J].
KELM, EC .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (05) :775-&
[8]  
LOW FJ, 1981, P SOC PHOTO-OPT INST, V280, P56
[10]   Development of cryogenic Ge JFETs [J].
Ward, RR ;
Kirschman, RK ;
Jhabvala, MD ;
Babu, RS ;
Das, NC ;
Camin, DV ;
Pessina, G .
JOURNAL DE PHYSIQUE IV, 1998, 8 (P3) :123-126