Nanomolding of PEG-Based Hydrogels with Sub-10-nm Resolution

被引:24
作者
Diez, Mar [1 ,2 ]
Mela, Petra [1 ,2 ]
Seshan, Venkatash [1 ,2 ]
Moeller, Martin [1 ,2 ]
Lensen, Marga C. [1 ,2 ]
机构
[1] DWI eV, D-52056 Aachen, Germany
[2] Rhein Westfal TH Aachen, Inst Tech & Macromol Chem, D-52056 Aachen, Germany
关键词
elastomers; fluoropolymers; hydrogels; nanolithography; patterning; NANOIMPRINT LITHOGRAPHY; SOFT LITHOGRAPHY; POLYETHYLENE-GLYCOL; IMPRINT LITHOGRAPHY; FABRICATION; NM; NANOPATTERNS; REPLICATION; FEATURES; MOLD;
D O I
10.1002/smll.200901313
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A simple, soft nanolithographic method is used to fabricate sub-10-nm structures on star polyethylene glycol-based hydrogels and perfluoropolyether-based materials. Very small features, for example, gold nanoparticles of size approximate to 8 nm with an interparticle distance of approximate to 100 nm, are successfully reproduced from a hard silicon master into both elastomers. Scanning force microscopy is used to investigate the replicas, and the original hexagonal pattern of the nanoparticles is clearly recognized. In addition, both replicas are usable as secondary, soft molds yielding positive copies of the primary, hard master. The results presented here show similar replication capabilities for both elastomers despite the markedly different properties of the precursors. Moreover, the hydrogel material can be easily peeled off from both soft and silicon master without the need for surface treatment. The procedure allows nanopatterning of a biocompatible material over large areas, which is a useful too to investigate cellular responses to defined nanotopography.
引用
收藏
页码:2756 / 2760
页数:5
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