Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

被引：35

作者：

Klosner, MA ^{[1
]}

Bender, HA ^{[1
]}

Silfvast, WT ^{[1
]}

Rocca, JJ ^{[1
]}

机构：

[1] COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523

来源：

OPTICS LETTERS | 1997年 / 22卷 / 01期

关键词：

CAPILLARY DISCHARGE; RAY; EMISSION;

D O I：

10.1364/OL.22.000034

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-cr transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wallplug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP. (C) 1997 Optical Society of America

引用

页码：34 / 36

页数：3

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