SYNCHROTRON-RADIATION SOURCES AND CONDENSERS FOR PROJECTION X-RAY-LITHOGRAPHY

被引：27

作者：

MURPHY, JB

WHITE, DL

MACDOWELL, AA

WOOD, OR

机构：

[1] BROOKHAVEN NATL LAB, NATL SYNCHROTRON LIGHT SOURCE, UPTON, NY 11973 USA

[2] AT&T BELL LABS, MURRAY HILL, NJ 07974 USA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 34期

关键词：

D O I：

10.1364/AO.32.006920

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The design requirements for a compact electron storage ring that could be used as a soft-x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required for collecting and conditioning the radiation in divergence, uniformity, and direction to illuminate the mask correctly and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft-x-ray projection lithography system that uses an electron storage ring as a soft-x-ray source are presented. It is shown that, by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130-angstrom photons for production line projection x-ray lithography is possible.

引用

页码：6920 / 6929

页数：10

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