Preparation and characterization of TiN-Ag nanocomposite films

被引：39

作者：

de los Arcos, T

Oelhafen, P

Aebi, U

Hefti, A

Düggelin, M

Mathys, D

Guggenheim, R

机构：

[1] Univ Basel, Inst Phys, CH-4056 Basel, Switzerland

[2] Univ Basel, ME Muller Inst, Biozentrum, CH-4056 Basel, Switzerland

[3] Univ Basel, SEM Lab, Pharmazentrum, CH-4056 Basel, Switzerland

来源：

VACUUM | 2002年 / 67卷 / 3-4期

关键词：

magnetron co-sputtering; TiN films; nanocomposite films; Ag clusters;

D O I：

10.1016/S0042-207X(02)00232-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin nanostructured films of TiN-Ag are deposited by a plasma vapour process consisting of co-sputtering of Ti and Ag from three magnetrons in an Ar-N-2 gas mixture. The coatings are characterized by in situ photoelectron spectroscopy, energy-filtered transmission electron microscopy and scanning electron microscopy. The dependence of the film structure and silver cluster distribution on total silver content, substrate biasing and substrate temperature was investigated. (C) 2002 Elsevier Science Ltd. All rights reserved.

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页码：463 / 470

页数：8

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