MOVPE growth of InPSb/InAs heterostructures for mid-infrared emitters

We investigated the growth of InPSb on GaSb or InAs by low pressure (20 mbar) metalorganic vapor phase epitaxy (MOVPE). Trimethylindium, triethylantimony, and phosphine were used as starting materials. High resolution x-ray diffraction, photoluminescence at 10K, Hall measurements at 300 and 77K as well as scanning electron microscopy and scanning tunneling electron microscopy investigations were carried out to verify the layer properties. Lattice-matched InPSb layers on InAs substrate grown at 520 degrees C show mirror-like surfaces and sharp x-ray peaks. N-type doping of InP0.69Sb0.31 was carried out with H2S and p-type doping was achieved with DEZn. Maximum electron concentrations of 2 x 10(19) cm(-3) and hole concentrations exceeding 10(18) cm(-3) were obtained after annealing in N-2 ambient. The thermal stability of InPSb was studied during annealing experiments carried out at 500 degrees C up to 30 min. The compositional integrity of the lattice proves to be stable and the InAs/InPSb interface can be improved. Multiple quantum well structures, pn-junction diodes and the two-dimensional electron gas at the InPSb/InAs/InPSb quantum wells were investigated to demonstrate the properties of the material.