Self-assembled monolayers containing biphenyl derivatives as challenge for nc-AFM

被引:13
作者
Nakasa, A [1 ]
Akiba, U [1 ]
Fujihira, M [1 ]
机构
[1] Tokyo Inst Technol, Dept Biomol Engn, Midori Ku, Yokohama, Kanagawa 2268501, Japan
关键词
chemical force microscopy; self-assembled monolayers; -CH3 and -COOH terminal groups; biphenylmethanethiols; scanning tunneling microscopy;
D O I
10.1016/S0169-4332(99)00567-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Mixed self-assembled monolayers (SAMs) of biphenylmethanethiol derivatives with -CH3 and -COOH terminal groups and those of 1-decanethiol and a biphenylmethanethiol derivative with a -CH3 or a -COOH terminal group were prepared on Au(lll) surfaces. The resulting mixed SAMs were imaged by scanning tunneling microscopy (STM), These mixed SAMs can be used to study chemical force microscopy (CFM) by noncontact atomic force microscopy (nc-AFM), Namely, the -CH3 and -COOH terminal groups of the SAMs can be recognized by different surface interactions with a surface functional group on a gold-coated AFM tip derivatized with the same thiol compound with a -CH3 or a -COOH terminal group. The present result also suggests that these SAMs can be used to study CFM using nc-AFM with simultaneous tunneling current measurement. By this method, for example, a molecular location of a biphenylmethanethiol derivative with a -COOH terminal group in an alkanethiol matrix observed by nc-AFM can be confirmed by the tunneling current measurement due to lower tunneling barrier height of the biphenylmethanethiol than that of the alkanethiol derivative. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:326 / 331
页数:6
相关论文
共 24 条
  • [11] Investigations of C60 molecules deposited on Si(111) by noncontact atomic force microscopy
    Kobayashi, K
    Yamada, H
    Horiuchi, T
    Matsushige, K
    [J]. APPLIED SURFACE SCIENCE, 1999, 140 (3-4) : 281 - 286
  • [12] Koleske DD, 1997, MATER RES SOC SYMP P, V464, P377
  • [13] PATTERNING SELF-ASSEMBLED MONOLAYERS - APPLICATIONS IN MATERIALS SCIENCE
    KUMAR, A
    BIEBUYCK, HA
    WHITESIDES, GM
    [J]. LANGMUIR, 1994, 10 (05) : 1498 - 1511
  • [14] Atomic force microscope imaging contrast based on molecular recognition
    Ludwig, M
    Dettmann, W
    Gaub, HE
    [J]. BIOPHYSICAL JOURNAL, 1997, 72 (01) : 445 - 448
  • [15] Atomic resolution in dynamic force microscopy across steps on Si(111)7 x 7
    Luthi, R
    Meyer, E
    Bammerlin, M
    Baratoff, A
    Lehmann, T
    Howald, L
    Gerber, C
    Guntherodt, HJ
    [J]. ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1996, 100 (02): : 165 - 167
  • [16] STRUCTURAL ORIGINS OF THE SURFACE DEPRESSIONS AT ALKANETHIOLATE MONOLAYERS ON AU(111) - A SCANNING TUNNELING AND ATOMIC-FORCE MICROSCOPIC INVESTIGATION
    MCDERMOTT, CA
    MCDERMOTT, MT
    GREEN, JB
    PORTER, MD
    [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1995, 99 (35) : 13257 - 13267
  • [17] Chiral discrimination by chemical force microscopy
    McKendry, R
    Theoclitou, ME
    Rayment, T
    Abell, C
    [J]. NATURE, 1998, 391 (6667) : 566 - 568
  • [18] THE PALLADIUM-CATALYZED CROSS-COUPLING REACTION OF PHENYLBORONIC ACID WITH HALOARENES IN THE PRESENCE OF BASES
    MIYAURA, N
    YANAGI, T
    SUZUKI, A
    [J]. SYNTHETIC COMMUNICATIONS, 1981, 11 (07) : 513 - 519
  • [19] Chemically-sensitive imaging in tapping mode by chemical force microscopy: Relationship between phase lag and adhesion
    Noy, A
    Sanders, CH
    Vezenov, DV
    Wong, SS
    Lieber, CM
    [J]. LANGMUIR, 1998, 14 (07) : 1508 - 1511
  • [20] Chemical force microscopy of microcontact-printed self-assembled monolayers by pulsed-force-mode atomic force microscopy
    Okabe, Y
    Furugori, M
    Tani, Y
    Akiba, U
    Fujihira, M
    [J]. ULTRAMICROSCOPY, 2000, 82 (1-4) : 203 - 212