Atomic resolution in dynamic force microscopy across steps on Si(111)7 x 7

被引：87

作者：

Luthi, R ^{[1
]}

Meyer, E ^{[1
]}

Bammerlin, M ^{[1
]}

Baratoff, A ^{[1
]}

Lehmann, T ^{[1
]}

Howald, L ^{[1
]}

Gerber, C ^{[1
]}

Guntherodt, HJ ^{[1
]}

机构：

[1] IBM CORP, RES LAB, ZURICH, SWITZERLAND

来源：

ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER | 1996年 / 100卷 / 02期

关键词：

D O I：

10.1007/s002570050106

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

In this note we report the first observation of salient features of the Si(111)7 x 7 reconstructed surface across monatomic steps by dynamic atomic force microscopy (AFM) in ultrahigh vacuum (UHV). Simultaneous measurements of the resonance frequency shift Delta f of the Si-cantilever and of the mean tunneling current <(I)over bar (t)> from the cleaned Si tip indicate a restricted range for stable imaging with true atomic resolution. The corresponding characteristics vs. distance reveal why feedback control via AS is problematic, whereas it is as successful as in conventional STM via <(I)over bar (t)>.

引用

页码：165 / 167

页数：3

共 18 条

[1] FREQUENCY-MODULATION DETECTION USING HIGH-Q CANTILEVERS FOR ENHANCED FORCE MICROSCOPE SENSITIVITY [J].