Fabrication of TiO2-based transparent conducting oxide films on glass by pulsed laser deposition

被引：54

作者：

Hitosugi, Taro ^{[1
]}

Ueda, Atsuki

Furubayashi, Yutaka

Hirose, Yasushi

Konuma, Seiji

Shimada, Toshihiro

Hasegawa, Tetsuya

机构：

[1] Univ Tokyo, Dept Chem, Tokyo 1130033, Japan

[2] KAST, Kawasaki, Kanagawa 2130012, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2007年 / 46卷 / 1-3期

关键词：

transparent conducting oxide; titanium dioxide; pulsed laser deposition;

D O I：

10.1143/JJAP.46.L86

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nb-doped anatase TiO2 (Ti0.94Nb0.06O2) films with excellent conductivity and transparency were deposited on non-alkali glass by pulsed laser deposition. X-ray diffraction analysis and transmission electron microscopy confirmed that the obtained films were polycrystalline with anatase structure. The films deposited at a substrate temperature of 250 degrees C with subsequent H-2 annealing at 500 degrees C showed a resistivity of 1.5 x 10(-3) Omega(.)cm at room temperature and an optical transmittance of 60-80% in the visible region. These results indicate that anatase Ti0.94Nb0.06O2 has great potential as a transparent conducting oxide that could replace Sn-doped In2O3 (ITO).

引用

页码：L86 / L88

页数：3

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