Metallization scheme for highly low-resistance, transparent, and thermally stable Ohmic contacts to p-GaN

被引:61
作者
Jang, JS [1 ]
Park, SJ [1 ]
Seong, TY [1 ]
机构
[1] Kwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
关键词
D O I
10.1063/1.126510
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on a promising metallization scheme for high-quality Ohmic contacts to surface-treated p-GaN:Mg (2-3x10(17) cm(-3)). It is shown that the as-deposited Pt/Ru contact produces a specific contact resistance of 7.8(+/- 2.2)x10(-4) Omega cm(2). However, annealing of the contact at 600 degrees C for 2 min results in a resistance of 2.2(+/- 2.0)x10(-6) Omega cm(2). It is also shown that the light transmittance of the annealed contact is 87.3% at 470 nm. Furthermore, the surface of the contact annealed at 600 degrees C for 30 min is found to be very smooth with a rms roughness of 0.8 nm. These results strongly indicate that the Pt/Ru can be a suitable scheme for the fabrication of high-performance laser diodes or other devices. (C) 2000 American Institute of Physics. [S0003- 6951(00)00220-5].
引用
收藏
页码:2898 / 2900
页数:3
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