Generation of amorphous silicon structures by rapid quenching: A molecular-dynamics study

被引:132
作者
Ishimaru, M [1 ]
Munetoh, S [1 ]
Motooka, T [1 ]
机构
[1] Kyushu Univ, Dept Mat Sci & Engn, Fukuoka 81281, Japan
来源
PHYSICAL REVIEW B | 1997年 / 56卷 / 23期
关键词
D O I
10.1103/PhysRevB.56.15133
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous silicon (a-Si) networks have been generated from melted Si with various quenching rates by molecular-dynamics (MD) simulations employing the Tersoff potential. The cooling rates were set between 5 x 10(11) and 1 x 10(14) K/s; the latter is the slowest quenching rate in MD simulations previously performed. Although the atomic configurations formed by the cooling rate of 10(14) K/s could reproduce the radial distribution function of a-Si obtained experimentally, they contained numerous structural defects such as threefold- and fivefold-coordinated atoms. As the cooling rate decreased, the average coordination number became approximate to 4 and tetrahedral bonds predominated. The structural and dynamical properties of a-Si generated by a cooling rate with similar to 10(12) K/s were in excellent agreement with those of a-Si obtained experimentally.
引用
收藏
页码:15133 / 15138
页数:6
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