H2S exposure of a (100)Ge surface:: Evidences for a (2x1) electrically passivated surface

被引:32
作者
Houssa, M.
Nelis, D.
Hellin, D.
Pourtois, G.
Conard, T.
Paredis, K.
Vanormelingen, K.
Vantomme, A.
Van Bael, M. K.
Mullens, J.
Caymax, M.
Meuris, M.
Heyns, M. M.
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Katholieke Univ Leuven, Inst Kern & Stralingsfys, B-3001 Louvain, Belgium
[3] Katholieke Univ Leuven, Inst Nanoscale Phys & Chem, B-3001 Louvain, Belgium
[4] Univ Hasselt, Mat Res Inst, Lab Inorgan & Phys Chem, B-3590 Diepenbeek, Belgium
关键词
D O I
10.1063/1.2743385
中图分类号
O59 [应用物理学];
学科分类号
摘要
The experimental study of the bonding geometry of a (100)Ge surface exposed to H2S in the gas phase at 330 degrees C shows that 1 ML S coverage with (2x1) surface reconstruction can be achieved. The amount of S on the Ge surface and the observed surface periodicity can be explained by the formation of disulfide bridges between Ge-Ge dimers on the surface. First-principles molecular dynamics simulations confirm the preserved (2x1) reconstruction after dissociative adsorption of H2S molecules on a (100)Ge (2x1) surface, and predict the formation of (S-H)-(S-H) inter-Ge dimer bridges, i.e., disulfide bridges interacting via hydrogen bonding. The computed energy band gap of this atomic configuration is shown to be free of surface states, a very important finding for the potential application of Ge in future high performance integrated circuits. (C) 2007 American Institute of Physics.
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页数:3
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