Total ionizing dose effects in NOR and NAND flash memories

被引:31
作者
Cellere, Giorgio [1 ]
Paccagnella, Alessandro
Visconti, Angelo
Bonanomi, Mauro
Beltrami, S.
Schwank, Jim R.
Shaneyfelt, Marty R.
Paillet, Philippe
机构
[1] Univ Padua, DEI, I-35100 Padua, Italy
[2] STMicroelect, FRM Adv R&D, I-20041 Agrate Brianza, MI, Italy
[3] Sandia Natl Labs, Albuquerque, NM 87185 USA
[4] CEA DIF, F-91680 Bruyeres Le Chatel, France
关键词
floating gate memories; proton irradiation; total; ionizing dose;
D O I
10.1109/TNS.2007.901199
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We irradiated floating gate (FG) memories with NOR and NAND architecture by using different TID sources, including 2 MeV, 98 MeV, and 105 MeV protons, X-rays, and gamma-rays. Two classes of phenomena are responsible for charge loss from pro-grammed FGs: the first is charge generation, recombination, and transport in the dielectrics, while the second is the emission of electrons above the oxide band. Charge loss from programmed FGs irradiated with protons of different energy closely tracks results from gamma-rays, whereas the use of X-rays results in dose enhancement effects.
引用
收藏
页码:1066 / 1070
页数:5
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