Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting

被引：89

作者：

Hagberg, Erik C.

Malkoch, Michael

Ling, Yibo

Hawker, Craig J.

Carter, Kenneth R.

机构：

[1] Univ Massachusetts, Conte Ctr Polymer Res, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

[2] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

[3] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA

来源：

NANO LETTERS | 2007年 / 7卷 / 02期

关键词：

D O I：

10.1021/nl061217f

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.

引用

页码：233 / 237

页数：5

共 18 条

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[2]

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