Effect of substrate material on phase evolution in reactively sputtered Cr-Al-N films

被引：13

作者：

Sun, Y ^{[1
]}

Wang, YH ^{[1
]}

Seow, HP ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Mat Engn, Singapore 639798, Singapore

来源：

JOURNAL OF MATERIALS SCIENCE | 2004年 / 39卷 / 24期

关键词：

D O I：

10.1023/B:JMSC.0000048753.48402.70

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：7369 / 7371

页数：3

共 12 条

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