Correlated piecewise diffusion of a Ge ad-dimer on the Si(001) surface

被引:28
作者
Lu, ZY [1 ]
Wang, CZ
Ho, KM
机构
[1] US DOE, Ames Lab, Ames, IA 50011 USA
[2] Iowa State Univ Sci & Technol, Dept Phys & Astron, Ames, IA 50011 USA
关键词
D O I
10.1103/PhysRevB.62.8104
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have performed extensive first-principles calculations to study the binding and diffusion of a Ge ad-dimer on the Si(001) surface. The diffusion of a Ge ad-dimer along the lowest-energy-barrier pathway is found to be piecewise but with strong correlation, and its energy barrier is 0.77 eV. Such a correlated piecewise diffusion pathway is also found to be favored by a Si ad-dimer on Si(001), with an energy barrier of 1.02 eV in excellent agreement with experimental measurements.
引用
收藏
页码:8104 / 8107
页数:4
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