Mechanical strength assessment of very thin films for optical and electronic applications

被引：9

作者：

Consiglio, R

Durand, N

Badawi, KF

Macquart, P

Lerbet, F

Assoul, M

von Stebut, J

机构：

[1] Ecole Mines, Lab Sci & Genie Surfaces, INPL, URA CNRS 1402,Cooperat Program,GDR G1108, F-54042 Nancy, France

[2] URA CNRS 131, Met Phys Lab, F-86960 Futuroscope, France

[3] Ctr Rech Aubervilliers, F-93303 Aubervilliers, France

[4] GMP, IUT Dept, Equipe Mecan Contact, Lab Corros & Traitements Surfaces, F-25009 Besancon, France

来源：

SURFACE & COATINGS TECHNOLOGY | 1997年 / 97卷 / 1-3期

关键词：

microscratch; friction fatigue; Atomic Force Microscopy; adhesive failure; very thin films;

D O I：

10.1016/S0257-8972(97)00136-9

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A micro scratch device for testing very thin optical and electronic coatings is presented. Owing to a down-scaled diamond indenter tip radius (2 mu m) and appropriate load range, coating and interface specific strength data can be assessed. Two case studies are presented: the first on the influence of the interface quality of W coatings on silicon wafers as modified by ion-beam techniques (post-implantation and ion-beam assisted deposition); the second on the influence of substrate nature and surface cleaning of flat glass prior to deposition of a magnetron sputtered Ni-Cr PVD coating. (C) 1997 Elsevier Science S.A.

引用

页码：192 / 199

页数：8

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