Dielectric studies on Cd0.4Zn0.6Te thin films

被引:26
作者
Prabakar, K [1 ]
Narayandass, SK [1 ]
Mangalaraj, D [1 ]
机构
[1] Bharathiar Univ, Dept Phys, Coimbatore 641046, Tamil Nadu, India
关键词
Cd0.4Zn0.6Te thin films; dielectric; modulus; impedance spectroscopy;
D O I
10.1016/S0254-0584(02)00388-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The dielectric responses of Cd0.4Zn0.6Te thin films, deposited by the vacuum evaporation technique, were studied as a function of frequency and temperature for different substrate temperatures of the deposited films. Combined modulus and impedance plots were used to study the response of the film, which in general contains grains, grain boundaries, and the electrode/film interface as capacitive elements. The conductivity of the deposited films decreases with increase in substrate temperature. The dielectric constant varied between 15 and 6.8 for the films deposited in the range of substrate temperatures 300-473 K. The frequency analysis of the modulus and impedance studies showed the distribution of the relaxation times due to the presence of grains and grain boundaries in the films. The values of activation energies derived from the dissipation factor and modulus were found to be 0.64 and 0.61 eV, respectively for the films deposited at room temperature, which are higher than the values calculated from conductivity (0.41 eV). The deviation in these values was attributed to the energetic conditions of the grains and grain boundaries. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:809 / 815
页数:7
相关论文
共 25 条
[1]   COMPLEX-PLANE ANALYSIS OF TRAPPING PHENOMENA IN ZINC-OXIDE BASED VARISTOR GRAIN-BOUNDARIES [J].
ALIM, MA ;
SEITZ, MA ;
HIRTHE, RW .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) :2337-2345
[2]   Variable-range-hopping conduction and dielectric relaxation in disordered Sr0.97(Ti1-xFex)O3-δ [J].
Ang, C ;
Jurado, JR ;
Yu, Z ;
Colomer, MT ;
Frade, JR ;
Baptista, JL .
PHYSICAL REVIEW B, 1998, 57 (19) :11858-11861
[3]   Oxygen-vacancy-related low-frequency dielectric relaxation and electrical conduction in Bi:SrTiO3 [J].
Ang, C ;
Yu, Z ;
Cross, LE .
PHYSICAL REVIEW B, 2000, 62 (01) :228-236
[4]   DIELECTRIC PROPERTIES OF THIN FILMS OF ALUMINIUM OXIDE AND SILICON OXIDE [J].
ARGALL, F ;
JONSCHER, AK .
THIN SOLID FILMS, 1968, 2 (03) :185-&
[5]   Dielectric relaxation in antiferroelectric multigrain PbZrO3 thin films [J].
Bharadwaja, SSN ;
Krupanidhi, SB .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 78 (2-3) :75-83
[6]   FILMS AND JUNCTIONS OF CADMIUM ZINC TELLURIDE [J].
CHU, TL ;
CHU, SS ;
FEREKIDES, C ;
BRITT, J .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (11) :5635-5640
[7]   Dielectric relaxation and defect analysis of Ta2O5 thin films [J].
Ezhilvalavan, S ;
Tsai, MS ;
Tseng, TY .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (10) :1137-1142
[8]   GROWTH OF CD1-XZNX TE BY MOLECULAR-BEAM EPITAXY [J].
FELDMAN, RD ;
AUSTIN, RF ;
DAYEM, AH ;
WESTERWICK, EH .
APPLIED PHYSICS LETTERS, 1986, 49 (13) :797-799
[9]   CURRENT-VOLTAGE CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE SPUTTER-DEPOSITED SRTIO3 THIN-FILMS [J].
FUKUDA, Y ;
AOKI, K ;
NUMATA, K ;
NISHIMURA, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (9B) :5255-5258
[10]   CHARACTERIZATION OF THE DIELECTRIC-PROPERTIES OF THIN-FILMS [J].
HILL, RM .
THIN SOLID FILMS, 1985, 125 (3-4) :277-289