Preparation of TiO2 thin films by pulsed laser deposition for waveguiding applications

被引：56

作者：

Garapon, C ^{[1
]}

Champeaux, C ^{[1
]}

Mugnier, J ^{[1
]}

Panczer, G ^{[1
]}

Marchet, P ^{[1
]}

Catherinot, A ^{[1
]}

Jacquier, B ^{[1
]}

机构：

[1] UNIV LIMOGES,URA320 CNRS,LAB MAT CERAM & TRAITEMENTS SURFACE,F-87060 LIMOGES,FRANCE

来源：

APPLIED SURFACE SCIENCE | 1996年 / 96-8卷

关键词：

D O I：

10.1016/0169-4332(95)00593-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

TiO2 thin films have been deposited on SiO2/Si, MgO and Al2O3 substrates by Pulsed Laser Deposition with a KrF excimer laser from a rutile ceramic target. From X-ray diffraction and Raman spectroscopy, their crystalline structure appear to be mainly anatase, The potentialities of waveguiding properties have been evaluated by measuring refractive index and thickness with m-line spectroscopy.

引用

页码：836 / 841

页数：6

共 15 条

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