Properties of niobium nitride coatings deposited by cathodic arc physical vapor deposition

被引：23

作者：

Cansever, N. ^{[1
]}

机构：

[1] Yildiz Tech Univ, Fac Chem Met, Dept Met & Mat Engn, TR-34210 Istanbul, Turkey

来源：

THIN SOLID FILMS | 2007年 / 515卷 / 7-8期

关键词：

niobium nitride; cathodic arc physical vapor deposition; microstructure; mechanical properties; hardness; adhesion;

D O I：

10.1016/j.tsf.2006.10.133

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of mobium nitride were deposited on high speed steel substrate by cathodic arc physical vapor deposition using -150 V, -200 V and -250 V bias voltages at 1 Pa nitrogen pressure. X-ray diffraction data showed that hexagonal delta-niobium nitride was formed for all bias voltages. Fracture cross-sections revealed the existence of the transition zone structure in all coatings. The maximum hardness was found to be 39 GPa. The Rockwell C adhesion and the scratch test were used to compare adhesion properties. In Rockwell adhesion test the best adhesion was obtained at -150 V bias voltage and in scratch test the cracks were occurred approximately at 3-5 Ns. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：3670 / 3674

页数：5

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