Microstructure of laterally oxidized AlxGa1-xAs layers in vertical-cavity lasers

被引:71
作者
Twesten, RD
Follstaedt, DM
Choquette, KD
Schneider, RP
机构
[1] Sandia National Laboratories, Albuquerque
[2] Hewlett Packard Laboratory, Palo Alto, CA 94304
关键词
D O I
10.1063/1.118103
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the lateral oxidation of AlxGa1-xAs (x=0.98 and 0.92) layers contained in vertical-cavity lasers using cross-sectional transmission electron microscopy. We find a fine-grained (similar to 4 nm) cubic spinel phase of Al2O3 in both the 2% Ga- and 8% Ca-oxidized layers. The 8% Ga-oxidized layers contract vertically by 6.7% and not the expected 20% for a fully dense Al2O3 layer, with the 2% Ga-oxidized layers showing a similar contraction. We observe a similar to 17-nm-thick amorphous interface between the oxidized and unoxidized AlxGa1-xAs layers, which may account for the excellent electrical properties of these devices. We also observe metastable amorphous cavities associated with the moving reaction front. We infer the reaction proceeds from an initial amorphous phase that then transforms to a porous gamma-Al2O3 layer.
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页码:19 / 21
页数:3
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