4H-SiC photoconductive switching devices for use in high-power applications

被引:94
作者
Dogan, S
Teke, A
Huang, D
Morkoç, H
Roberts, CB
Parish, J
Ganguly, B
Smith, M
Myers, RE
Saddow, SE
机构
[1] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[2] Ltd Liabil Corp, Tech Explore, Oxford, OH 45056 USA
[3] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA
[4] Elect Engn Univ S Florida, Tampa, FL 33543 USA
[5] Ataturk Univ, Fac Arts & Sci, Dept Phys, TR-25240 Erzurum, Turkey
[6] Balikesir Univ, Fac Arts & Sci, Dept Phys, TR-10100 Balikesir, Turkey
关键词
D O I
10.1063/1.1571667
中图分类号
O59 [应用物理学];
学科分类号
摘要
Silicon carbide is a wide-band-gap semiconductor suitable for high-power high-voltage devices and it has excellent properties for use in photoconductive semiconductor switches (PCSSs). PCSS were fabricated as planar structures on high-resistivity 4H-SiC and tested at dc bias voltages up to 1000 V. The typical maximum photocurrent of the device at 1000 V was about 49.4 A. The average on-state resistance and the ratio of on-state to off-state currents were about 20 Omega and 3x10(11), respectively. Photoconductivity pulse widths for all applied voltages were 8-10 ns. These excellent results are due in part to the removal of the surface damage by high-temperature H-2 etching and surface preparation. Atomic force microscopy images revealed that very good surface morphology, atomic layer flatness, and large step width were achieved. (C) 2003 American Institute of Physics.
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页码:3107 / 3109
页数:3
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