Nanometer definition of atomic beams with masks of light

被引：54

作者：

Abfalterer, R

Keller, C

Bernet, S

Oberthaler, MK

Schmiedmayer, J

Zeilinger, A

机构：

[1] Universitat-Innsbruck, Innsbruck

来源：

PHYSICAL REVIEW A | 1997年 / 56卷 / 06期

关键词：

D O I：

10.1103/PhysRevA.56.R4365

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We build amplitude, i.e., absorptive masks, for neutral atoms using light, reversing the roles of light and atoms as compared to conventional optics. These masks can be used both to create and to probe spatially well-defined atomic distributions. The resolution of these masks can be significantly better than the optical wavelength. Applications range from atom lithography to fundamental atom optical experiments. [S1050-2947(97)50412-4].

引用

页码：R4365 / R4368

页数：4

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