Temperature and thickness dependence of magnetic moments in NiO epitaxial films

被引:251
作者
Alders, D
Tjeng, LH
Voogt, FC
Hibma, T
Sawatzky, GA
Chen, CT
Vogel, J
Sacchi, M
Iacobucci, S
机构
[1] Univ Groningen, Solid State Phys Lab, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
[2] Univ Groningen, Dept Chem Phys, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
[3] Univ Groningen, Solid State Phys Lab, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
[4] Synchrotron Radiat Res Ctr, Hsinchu 30077, Taiwan
[5] Ctr Univ Paris Sud, Utilisat Rayonnement Electromagnet Lab, F-91405 Orsay, France
关键词
D O I
10.1103/PhysRevB.57.11623
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We show that linear polarized x-ray-absorption spectroscopy can be used to measure the temperature and thickness dependence of magnetic moments in NiO thin films. We demonstrate that both the long-range order and the nearest-neighbor spin-spin correlations can be revealed. NiO (100) films with thicknesses of 5, 10, and 20 monolayers epitaxially grown on MgO (100) are studied. The Neel temperature is found to be strongly reduced from the bulk value even for the 20 monolayer film.
引用
收藏
页码:11623 / 11631
页数:9
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