Comparison of electronic structures of doped ZnO by various impurity elements calculated by a first-principle pseudopotential method

被引:78
作者
Imai, Y [1 ]
Watanabe, A [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058565, Japan
关键词
D O I
10.1023/B:JMSE.0000043423.16928.56
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electronic band calculations of ZnO doped with Li, Al, Ga, In, Si, Ge, Y, Ti, V, Cr, Mn, Fe, Co, Ni, and Cu have been done within a framework of local density approximation, and partial densities of states (PDOSs) of dopants have been evaluated. PDOS of AI(Ga, In) of ZnO: AI(Ga, In) has delocalized nature, which is considered to be responsible for good conductivity of Al-doped ZnO. PDOS values of Cu and Li of ZnO: Cu and ZnO: Li are quite small at their Fermi levels (EFS), and this may be one of the possible reasons for their insulating nature as well as the compensation effects. PDOS values of Si and Ge of ZnO: Si and ZnO: Ge at their E(F)s are relatively large but are less delocalized compared to that of ZnO: AI(Ga, In). As for ZnO: Y, ZnO: Ti, and ZnO: V, PDOS values of Y(Ti, V) are small at their EFS-ZnO: Cr and ZnO: Mn have isolated impurity levels between the energy gap of ZnO and their EFs are located on these levels, seemingly resulting in poor conductivities. EFS Of ZnO: Fe(Co, NO are located near the top of the valence band, and PDOS values of Fe(Co, Ni) at their EFs are relatively large. Their semiconducting nature might be caused by strong correlation between electrons which is beyond the description of a band calculation. (C) 2004 Kluwer Academic Publishers.
引用
收藏
页码:743 / 749
页数:7
相关论文
共 33 条
[1]  
DELA M, 2001, J VAC SCI TECHNOL A, V19, P2097
[2]   Effect of Al and Mn doping on the electrical conductivity of ZnO [J].
Han, JP ;
Mantas, PQ ;
Senos, AMR .
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2001, 21 (10-11) :1883-1886
[3]  
Hartmann A, 1996, SURF INTERFACE ANAL, V24, P671, DOI 10.1002/(SICI)1096-9918(19960916)24:9<671::AID-SIA165>3.0.CO
[4]  
2-D
[5]   TEXTURED ALUMINUM-DOPED ZINC-OXIDE THIN-FILMS FROM ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR DEPOSITION [J].
HU, JH ;
GORDON, RG .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (02) :880-890
[6]   Comparison of electronic structures of doped ZnS and ZnO calculated by a first-principle pseudopotential method [J].
Imai, Y ;
Watanabe, A ;
Shimono, I .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2003, 14 (03) :149-156
[7]   Calculation of electronic energy and density of state of iron-disilicides using a total-energy pseudopotential method, CASTEP [J].
Imai, Y ;
Mukaida, M ;
Tsunoda, T .
THIN SOLID FILMS, 2001, 381 (02) :176-182
[8]   Modification of ZnO thin films by Ni, Cu, and Cd doping [J].
JimenezGonzalez, AE .
JOURNAL OF SOLID STATE CHEMISTRY, 1997, 128 (02) :176-180
[9]   Ferroelectric behavior of Li-doped ZnO thin films on Si(100) by pulsed laser deposition [J].
Joseph, M ;
Tabata, H ;
Kawai, T .
APPLIED PHYSICS LETTERS, 1999, 74 (17) :2534-2536
[10]   p-type electrical conduction in ZnO thin films by Ga and N codoping [J].
Joseph, M ;
Tabata, H ;
Kawai, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (11A) :L1205-L1207