Homoepitaxial growth of non-polar ZnO (11(2)over-bar-0) films on off-angle ZnO substrates by MOCVD

被引:24
作者
Abe, T. [1 ]
Kashiwaba, Y.
Onodera, S.
Masuoka, F.
Nakagawa, A.
Endo, H.
Niikura, I.
Kashiwaba, Y.
机构
[1] Iwate Univ, 4-3-5 Ueda, Morioka, Iwate 0208551, Japan
[2] Sendai Natl Coll Technol, Aoba Ku, Sendai, Miyagi 9893128, Japan
[3] Iwate Ind Res Inst, Morioka, Iwate 0200852, Japan
关键词
X-ray diffraction; metalorganic chemical vapor deposition; Zn compounds; semiconducting II-VI materials;
D O I
10.1016/j.jcrysgro.2006.10.056
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Homoepitaxial ZnO (11 (2) over bar0) films were successfully prepared on single crystal ZnO (11 (2) over bar0) substrates with off-angles of 0 degrees, 1 degrees, 2 degrees and 3 degrees toward the [1 (1) over bar 00] direction by using an atmospheric pressure MOCVD. A striped pattern along the ZnO [0 0 0 1] direction was observed in ZnO films, and surface smoothness of ZnO films was remarkably improved by increase in off-angle. Full-width at half-maximum of XRD patterns of rocking curves and 2 theta-omega scans for (0 0 0 2) and (10 (1) over bar0) planes measured by grazing incident diffraction measurement was decreased with increase in off-angles. Free exciton emissions and donor-bound exciton emissions were clearly observed in the photoluminescence (PL) spectra of ZnO films deposited on ZnO substrates with off-angles measured at 5 K. Room temperature PL spectra of ZnO films have a strong band edge emission on the samples with ZnO films deposited on off-angle substrates. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:457 / 460
页数:4
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