Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

被引：32

作者：

Gorelick, Sergey ^{[1
]}

Vila-Comamala, Joan ^{[1
]}

Guzenko, Vitaliy ^{[1
]}

Mokso, Rajmund ^{[1
]}

Stampanoni, Marco ^{[1
]}

David, Christian ^{[1
]}

机构：

[1] Paul Scherrer Inst, CH-5235 Villigen, Switzerland

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 5-8期

关键词：

High aspect ratio; PMMA; Electron beam lithography; X-ray optics; Hard X-rays; Au electroplating; ZONE PLATES; TRANSMISSION; MICROSCOPY; CONDENSER;

D O I：

10.1016/j.mee.2009.11.091

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in similar to 1 mu m thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 key photon energy showing a good diffraction efficiency of 10%. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1052 / 1056

页数：5

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