Conductive layer near the GaN/sapphire interface and its effect on electron transport in unintentionally doped n-type GaN epilayers

被引:57
作者
Cheong, MG [1 ]
Kim, KS
Oh, CS
Namgung, NW
Yang, GM
Hong, CH
Lim, KY
Suh, EK
Nahm, KS
Lee, HJ
Lim, DH
Yoshikawa, A
机构
[1] Chonbuk Natl Univ, Semicond Phys Res Ctr, Chongju 561756, South Korea
[2] Chonbuk Natl Univ, Dept Semicond Sci & Technol, Chongju 561756, South Korea
[3] Chiba Univ, Ctr Frontier Elect & Photon, Chiba 2638522, Japan
关键词
D O I
10.1063/1.1318728
中图分类号
O59 [应用物理学];
学科分类号
摘要
Temperature-dependent Hall effect measurements on unintentionally doped n-type GaN epilayers show that, above room temperature, the Hall-mobility values of different samples vary parallel with each other with temperature. We demonstrate that this anomaly is mainly due to a conductive layer near the GaN/sapphire interface for thin samples with low carrier density. Through trapping electrons, threading edge dislocations (TEDs) debilitate the epilayer contribution in a two-layer mixed conduction model involving the epilayer and the near-interface layer. The trapping may, in part, explain low mobility and anomalous transport in pure GaN layers. Scattering by TEDs is important only at low temperatures. (C) 2000 American Institute of Physics. [S0003-6951(00)02742-X].
引用
收藏
页码:2557 / 2559
页数:3
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