The fabrication of high resolution features by mould injection

被引:34
作者
Macintyre, D [1 ]
Thoms, S [1 ]
机构
[1] Univ Glasgow, Dept Elect & Elect Engn, Nanoelectr Res Ctr, Glasgow G12 8QQ, Lanark, Scotland
关键词
D O I
10.1016/S0167-9317(98)00048-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes work carried out to develop a relatively simple procedure to mass produce high resolution and large area features in polymer by mould injection. Fabrication of the injection mould using high resolution electron beam lithography is described and the results of production runs evaluated. Feature sizes of less than 100 nm were obtained and 4 centimetre long 1:1 gratings with periods down to 1 mu m produced. Features with high aspect ratio proved difficult to form routinely however it is envisaged that further optimization of the process will resolve these difficulties. It is our belief that the ultimate resolution of this technique is limited largely by the quality of mould tool manufacturing.
引用
收藏
页码:211 / 214
页数:4
相关论文
共 5 条
  • [1] 3 nm NiCr wires made using electron beam lithography and PMMA resist
    Cumming, DRS
    Thoms, S
    Weaver, JMR
    Beaumont, SP
    [J]. MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 423 - 425
  • [2] HILL C, 1985, POLYM MAT
  • [3] High resolution electron beam lithography studies on Shipley chemically amplified DUV resists
    Macintyre, D
    Thoms, S
    [J]. MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 213 - 216
  • [4] MortonJones D. H., 1989, POLYM PROCESSING
  • [5] Wilson J., 1987, PRENTICE HALL INT SE