3 nm NiCr wires made using electron beam lithography and PMMA resist

被引：25

作者：

Cumming, DRS

Thoms, S

Weaver, JMR

Beaumont, SP

机构：

[1] Nanoelectronics Research Centre, Dept. of Electronics and Elec. Eng., University of Glasgow, Glasgow

来源：

MICROELECTRONIC ENGINEERING | 1996年 / 30卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(95)00278-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate the fabrication of sub -5 nm NiCr wires using conventional 100 kV electron beam lithography and PMMA resist technology. The wires are short, and widen to continuous 20 nm wires at either end. The ultra high resolution is achieved using a novel exposure technique. These wires are believed to be the smallest features yet mane using this technology.

引用

页码：423 / 425

页数：3

共 8 条

[1] SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF
BEAUMONT, SP
BOWER, PG
TAMAMURA, T
WILKINSON, CDW
[J]. APPLIED PHYSICS LETTERS, 1981, 38 (06) : 436 - 439
[2] RESOLUTION LIMITS FOR ELECTRON-BEAM LITHOGRAPHY
BROERS, AN
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (04) : 502 - 513
[3] FABRICATION OF 5-7 NM WIDE ETCHED LINES IN SILICON USING 100 KEV ELECTRON-BEAM LITHOGRAPHY AND POLYMETHYLMETHACRYLATE RESIST
CHEN, W
AHMED, H
[J]. APPLIED PHYSICS LETTERS, 1993, 62 (13) : 1499 - 1501
[4] FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES
CHEN, W
AHMED, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2519 - 2523
[5] 10-NM LINEWIDTH ELECTRON-BEAM LITHOGRAPHY ON GAAS
CRAIGHEAD, HG
HOWARD, RE
JACKEL, LD
MANKIEWICH, PM
[J]. APPLIED PHYSICS LETTERS, 1983, 42 (01) : 38 - 40
[6] THE GENERALIZED BACKSCATTERING COEFFICIENT - A NOVEL PARAMETER IN ELECTRON-SCATTERING PROCESSES
MESSINA, G
PAOLETTI, A
SANTANGELO, S
TUCCIARONE, A
[J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 385 - 388
[7] RISHTON SA, THESIS U GLASGOW
[8] A JEOL 100 CXII CONVERTED FOR USE AS AN ELECTRON-BEAM LITHOGRAPHY SYSTEM
THOMS, S
BEAUMONT, SP
WILKINSON, CDW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1823 - 1826

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