Reactivity of the H-Si (111) surface

The H-Si (111) surface has been well characterized [Hricovini et al., Phys. Rev. Lett. 70 (1993) 1992], so the reactivity of this surface was studied. H-Si (111) surfaces exposed to Cl-2, Br-2, and 1-alkenes were studied with photoemission spectroscopy. These particular compounds were chosen because of their importance in semiconductor processing and surface functionalization. The observation of the growth of a Si 2p component at high binding energy, characteristic of halogen reactivity, confirmed that bromine and chlorine gases both reacted with the H-Si (111) surface. Reactions with 1-alkenes were confirmed by measuring both the Si 2p and the C 1s core level spectra. The C 2s-based molecular orbitals in the valence band revealed the identity of the alkyl monolayer on the Si (111) surface. Therefore, we found that the H-Si (111) surface, under certain conditions, was reactive. (C) 1997 Elsevier Science B.V.