Effect of electron irradiation on properties of chemically deposited TiO2 nanorods

被引：15

作者：

Dhawale, D. S. ^{[1
]}

Dubal, D. P. ^{[1
]}

Salunkhe, R. R. ^{[1
]}

Gujar, T. P. ^{[1
]}

Rath, M. C. ^{[2
]}

Lokhande, C. D. ^{[1
]}

机构：

[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India

[2] Bhabha Atom Res Ctr, Radiat & Photochem Div, Bombay 400085, Maharashtra, India

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2010年 / 499卷 / 01期

关键词：

CBD; TiO2; Nanorods; Thin films; Electron irradiation; THIN-FILMS; GROWTH; ZNO;

D O I：

10.1016/j.jallcom.2010.01.126

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

TiO2 nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2 to 9 degrees, red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 10(6) to 10(3) of TiO2 nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：63 / 67

页数：5

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