Solubility-driven thin film structures of regioregular poly(3-hexyl thiophene) using volatile solvents

被引:190
作者
Yang, Hoichang [1 ]
LeFevre, Scott W.
Ryu, Chang Y.
Bao, Zhenan
机构
[1] Rensselaer Polytech Inst, Rensselaer Nanotechnol Ctr, Troy, NY 12180 USA
[2] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2734387
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using atomic force microscopy and grazing-incidence x-ray diffraction, the authors found that the use of volatile CH2Cl2 not only offers an advantage in minimizing regioregular poly(3-hexyl thiophene) (RR P3HT) film deposition time, but also directs the desirable parallel orientation of pi-pi stacking planes of RR P3HT with respect to solid substrates, for both spin and drop castings. The substrate temperature effects have been investigated to support claims that the substrate-induced crystallization of RR P3HT preseeds the parallel oriented crystals prior to spin casting, when the warm CH2Cl2 solution is loaded on a "cold" substrate held at room temperature. (c) 2007 American Institute of Physics.
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页数:3
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