Spatial uniformity of Schottky contacts between aluminum and hydrogenated homoepitaxial diamond films

被引:16
作者
Takeuchi, D
Yamanaka, S
Watanabe, H
Okushi, H
Kajimura, K
机构
[1] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
[2] Univ Tsukuba, Fac Mat Sci, Tsukuba, Ibaraki 3058573, Japan
关键词
Schottky contacts; hydrogenated surface; homoepitaxial diamond; stability; spatial uniformity;
D O I
10.1016/S0169-4332(00)00103-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Homoepitaxial diamond films prepared under low CH4 concentration conditions (CH4/H-2 < 0.15%) show atomically flat surfaces over the whole area (4 X 4 mm(2)) of the substrate. Using these diamond films, Schottky contacts between Al and the high-conductivity layer near the surface of as-grown film have been successfully made with an excellent uniformity with ideal properties. For example, in the film grown at low CH4 concentration of 0.016% CH4/H-2, the ideality factor (n value) and the barrier heights of the Schottky junctions (phi(b)) were close to unity (n < 1.1) and 1.5-1.6 eV, respectively, for nearly all junctions (> 42 dots) prepared on the same Aim. This result indicates that the quality of the films with atomically flat surfaces over the whole area of the substrate is actually excellent in a viewpoint of chemical stability as well as electrical characteristic. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:572 / 577
页数:6
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