Application of optical transmission interferometry for in-situ structural investigations of titanium dioxide sputter-deposited coatings

被引:11
作者
Lapostolle, F.
Perry, F.
Billard, A.
机构
[1] Ecole Mines, CNRS, UMR 7570, INPL,Lab Sci & Genie Surface, F-54042 Nancy, France
[2] PVDco Sarl, F-54120 Baccarat, France
[3] UTBM, LERMPS, F-90010 Belfort, France
关键词
optical interferometry; titanium dioxide; reactive sputtering; TIO2; FILMS; THIN-FILMS; DENSITY;
D O I
10.1016/j.surfcoat.2006.05.015
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Titanium dioxide coatings (from 0.1 to 1.5 mu m thick) have been dc sputter-deposited on glass slides from titanium targets in various Ar-O-2 reactive gas mixtures. Deposition rate and optical properties were controlled in-situ by optical transmission interferometry (OTI) with an optical fibre located behind the glass substrate in order to perform a real-time control of transmittance of the growing film. Thus, it is possible to determine in-situ the optical indices (n, k) and the thickness of the as-deposited film by using a simple simulation, developed on Matlab software. The optical properties of the films were investigated in relation to their structure, which depends on the sputtering conditions adopted. In particular, the effects of the sputtering pressure (working pressure and oxygen partial pressure), the discharge power and the substrate location into the reactor are investigated in detail. Films structure is assessed by standard grazing incidence X-ray diffraction (XRD). (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:2633 / 2638
页数:6
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