Molecular beam epitaxy of wurtzite CdSe on GaAs{111} substrates

被引:8
作者
Ohishi, M [1 ]
Yoneta, M [1 ]
Saito, H [1 ]
Sawada, H [1 ]
Mori, S [1 ]
机构
[1] Okayama Univ Sci, Dept Appl Phys, Okayama 700, Japan
关键词
cadmium selenide (CdSe); molecular beam epitaxy (MBE); atomic layer epitaxy (ALE); Se sublimation; polar surface;
D O I
10.1016/S0022-0248(98)80293-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Wurtzite-CdSe epitaxial layers on GaAs(1 1 1)A and B substrates were grown by molecular beam epitaxy using elemental Cd and Se beams. A distinct RHEED oscillation of a specular spot intensity was observed during ALE growth of CdSe on GaAs(1 1 1)B, but the oscillation on GaAs(1 1 1)A was poor. A GaAs(1 1 1)B substrate is superior to GaAs(1 1 1)A substrate for the layer-by-layer growth of wurtzite CdSe. The activation energy of Se desorption from the GaAs(1 1 1)B surface was determined as 1.2 +/- 0.1 eV by analyzing the temporal specular beam intensity. The crystallographic and luminescence properties are also presented. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:57 / 61
页数:5
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