Field emission studies of pulsed laser deposited LaB6 films on W and Re

被引:59
作者
Late, Dattatray J.
More, Mahendra A.
Misra, Pankaj
Singh, B. N.
Kukreja, Lalit M.
Joag, Dilip S. [1 ]
机构
[1] Univ Pune, DST Unit Nanosci, Pune 411007, Maharashtra, India
[2] Univ Pune, Ctr Adv Studies Mat Sci & Condensed Matter Phys, Dept Phys, Pune 411007, Maharashtra, India
[3] Raja Ramanna Ctr Adv Technol, Thin Film Lab, Indore 452013, India
关键词
field emission; pulsed laser deposition and LaB6;
D O I
10.1016/j.ultramic.2007.02.014
中图分类号
TH742 [显微镜];
学科分类号
摘要
Lanthanum hexaboride films were grown on tungsten and rhenium tips and foils by pulsed laser deposition. The X-ray diffraction spectra of the PLD LaB6 films on both the substrates show crystalline nature with average grain size similar to 125 nm. The field emission studies of pointed and foil specimens were performed in conventional and planar diode configurations, respectively, under ultra-high vacuum condition. An estimated current density of similar to 1.2 x 10(4) A/cm(2) was drawn at the electric field of 3 x 10(3) and 6 x 10(3) V/mu m from the LaB6 coated tips of tungsten and rhenium, respectively. The Fowler-Nordheim plots were found to be linear showing metallic behavior of the emitters. The field enhancement factors were calculated from the slopes of the Fowler-Nordheim plots, indicating that the field emission is from LaB6 nanoscale protrusions present on emitter surfaces. The emitters were operated for long time current stability (3 h) studies. The post-field emission surface morphology of the emitters showed no significant erosion of LaB6 films during 3 h continuous operation. The observed behavior indicates that it is linked with the growth of LaB6 films on W and Re. These results reveal that the LaB6 films exhibit high resistance to ion bombardment and excellent structural stability and are more promising emitters for practical applications in field emission based devices. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:825 / 832
页数:8
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