All solid-state rechargeable thin-film microsupercapacitor fabricated with tungsten cosputtered ruthenium oxide electrodes

被引：54

作者：

Kim, HK ^{[1
]}

Cho, SH

Ok, YW

Seong, TY

Yoon, YS

机构：

[1] Kwangju Inst Sci & Technol, KJIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea

[2] Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 03期

关键词：

D O I：

10.1116/1.1565348

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We investigate an all solid-state thin-film microsupercapacitor (TFSC) fabricated with tungsten cosputtered ruthenium oxide electrodes (W-RuO2) and LiPON electrolyte. It is shown that the room-temperature charge-discharge behavior of the TFSC is similar to that of a bulk-type supercapacitor. It is also shown that the W-RuO2-based TFSC exhibits a higher discharge specific capacitance and more stable cyclibility, compared with those of the RuO2-based TFSC. Based on the pseudocapacitance of the oxide electrodes, the cycling behavior of the TFSCs and tungsten cosputtering effect on the electrochemical properties of TFSCs are described. (C) 2003 American Vacuum Society.

引用

页码：949 / 952

页数：4

共 24 条

[1]

[Anonymous], P DIMACS WORKSH CONT

[2]

Conway B. E., 1999, ELECTROCHEMICAL SUPE, DOI DOI 10.1007/978-1-4757-3058-6

[3] The role and utilization of pseudocapacitance for energy storage by supercapacitors [J].

Conway, BE ;

Birss, V ;

Wojtowicz, J .

JOURNAL OF POWER SOURCES, 1997, 66 (1-2) :1-14

[4] Lithium trapping by excess oxygen in WO3:: A first-principles study [J].

de Wijs, GA ;

de Groot, RA .

PHYSICAL REVIEW B, 2000, 62 (03) :1508-1511

[5] ALGORITHMS FOR THE RAPID SIMULATION OF RUTHERFORD BACKSCATTERING SPECTRA [J].

DOOLITTLE, LR .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 9 (03) :344-351

[6] All-solid-state electrochromic reflectance device for emittance modulation in the far-infrared spectral region [J].

Franke, EB ;

Trimble, CL ;

Schubert, M ;

Woollam, JA ;

Hale, JS .

APPLIED PHYSICS LETTERS, 2000, 77 (07) :930-932

[7] Molecular dynamics simulation of the effect of crystal orientation on lithium-ion diffusion at the V2O5/Li2SiO3 interface [J].

Garcia, ME ;

Garofalini, SH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (03) :840-849

[8] Epitaxial growth of highly conductive RuO2 thin films on (100) Si [J].

Jia, QX ;

Song, SG ;

Wu, XD ;

Cho, JH ;

Foltyn, SR ;

Findikoglu, AT ;

Smith, JL .

APPLIED PHYSICS LETTERS, 1996, 68 (08) :1069-1071

[9] OBSERVATION OF OXYGEN ENRICHMENT IN ZIRCONIUM-OXIDE FILMS [J].

KHAWAJA, EE ;

BOUAMRANE, F ;

HALLAK, AB ;

DAOUS, MA ;

SALIM, MA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (03) :580-587

[10] Correlation between the microstructures and the cycling performance of RuO2 electrodes for thin-film microsupercapacitors [J].

Kim, HK ;

Seong, TY ;

Lim, JH ;

Ok, YW ;

Cho, WI ;

Shin, YH ;

Yoon, YS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05) :1827-1832

← 1 2 3 →